供应美国lightsmyth纳米花样硅片模具

8. Nanopatterned Silicon Stamps (纳米花样硅片模具)

LightSmyth offers a large variety of nanomachined single crystal silicon substrates providing a low-cost entry into nanophotonics research for industry and academic institutions. The substrates may be used in a variety of applications in optics, photonics, biology, chemistry, physics (e.g. neutron scattering), polymer research, nanoimprinting, microfluidics and others. If desired, the substrates can be coated with metallic or dielectric coating. Most of the surface features have slightly trapezoidal cross-section profiles with straight parallel mesas and trenches. Lattice-like structures are available as well. A number of feature sizes and trench depth is available. SEM images of the substrates may be taken prior to shipment to verify the exact profile.

New nanostamps are added to our stock frequently. Please contact our application scientists if you cannot find a nanostructure you need in our stock list.

Linear Nanostamps (line+space)

Period Groove depth Duty cycle 1 Line width 2 Size 3 Part number 139 nm 50 nm 50% 69.5 nm 12.5�12.5�0.7 mm SNS-C72-1212-50-P 139 nm 50 nm 50% 69.5 nm 25�25�0.7 mm 5 SNS-C72-2525-50-P 278 nm 110 nm 50% 139 nm 12.5�12.5�0.7 mm SNS-C36-1212-110-P 416.6 nm 110 nm 50% 208 nm 12.5�12.5�0.7 mm SNS-C24-1212-110-P 500 nm multiple 6 44% 220 nm 8�8.3�0.7 mm SNS-C20-0808-xxx-D45-P 500 nm multiple 6 60% 300 nm 8�8.3�0.7 mm SNS-C20-0808-xxx-D60-P 555.5 nm 110 nm 50% 278 nm 20�9�0.7 mm SNS-C18-2009-110-D50-P 555.5 nm 140 nm 50% 278 nm 20�9�0.7 mm SNS-C18-2009-140-D50-P 555.5 nm 110 nm 29% 158 nm 20�9�0.7 mm SNS-C18-2009-110-D29-P 555.5 nm 140 nm 29% 158 nm 20�9�0.7 mm SNS-C18-2009-140-D29-P 600 nm multiple 6 43% 260 nm 8�8.3�0.7 mm SNS-C16.7-0808-xxx-D45-P 600 nm multiple 6 55% 330 nm 8�8.3�0.7 mm SNS-C16.7-0808-xxx-D55-P 606 nm 190 nm 50% 303 nm 29�12�0.7 mm SNS-C16.5-2912-190-P 606 nm 190 nm 50% 303 nm 29�12�0.7 mm SNS-C16.5-2912-190-S 4 606 nm 190 nm 50% 303 nm 29�24.2�0.7 mm 5 SNS-C16.5-2924-190-P 675 nm 170 nm 32% 218 nm 24�10�0.7 mm SNS-C14.8-2410-170-P 675 nm 170 nm 32% 218 nm 24�30.4�0.7 mm 5 SNS-C14.8-2430-170-P 700 nm multiple 6 47% 330 nm 8�8.3�0.7 mm SNS-C14.3-0808-xxx-D45-P 700 nm multiple 6 55% 375 nm 8�8.3�0.7 mm SNS-C14.3-0808-xxx-D55-P 833.3 nm 200 nm 50% 416 nm 12.5�12.5�0.7 mm SNS-C12-1212-200-P 833.3 nm 200 nm 50% 416 nm 25�25�0.7 mm 5 SNS-C12-2525-200-P

2D nanostamps (rectangular and hexagonal lattice)

Period Lattice type Groove depth Feature width Size Part number 500 nm rect post multiple 1 135 nm 8�8.3�0.7 mm S2D-24B1-0808-xxx-P 500 nm rect post multiple 1 210 nm 8�8.3�0.7mm S2D-18B1-0808-xxx-P 600 nm rect post multiple 1 195 nm 8�8.3�0.7mm S2D-24B2-0808-xxx-P 600 nm rect post multiple 1 275 nm 8�8.3�0.7mm S2D-18B2-0808-xxx-P 700 nm rect post multiple 1 260 nm 8�8.3�0.7mm S2D-24B3-0808-xxx-P 700 nm rect post multiple 1 350 nm 8�8.3�0.7mm S2D-18B3-0808-xxx-P 500 nm hex post multiple 1 165 nm 8�8.3�0.7mm S2D-18C1-0808-xxx-P 600 nm hex post multiple 1 165 nm 8�8.3�0.7mm S2D-24C2-0808-xxx-P 600 nm hex post multiple 1 240 nm 8�8.3�0.7mm S2D-18C2-0808-xxx-P 700 nm hex post multiple 1 220 nm 8�8.3�0.7mm S2D-24C3-0808-xxx-P 700 nm hex post multiple 1 290 nm 8�8.3�0.7mm S2D-18C3-0808-xxx-P 600 nm hex hole multiple 1 180 nm 8�8.3�0.7mm S2D-24D2-0808-xxx-P 700 nm hex hole multiple 1 200 nm 8�8.3�0.7mm S2D-18D3-0808-xxx-P 700 nm hex hole multiple 1 290 nm 8�8.3�0.7mm S2D-24D3-0808-xxx-P